An $n$-type and $p$-type semiconductor can be obtained by respectively doping pure silicon with

$A$ semiconductor has equal electron and hole concentration of $2 \times 10^8 \ m^{-3}$. On doping with a certain impurity, the electron concentration increases to $4 \times 10^{10} \ m^{-3}$. What is the new hole concentration of the semiconductor?

In a $p-$type semiconductor, which of the following statements is true?

When phosphorus and antimony are mixed in germanium,then:

In $P$-type semiconductors,the majority and minority charge carriers are respectively:

$A$ potential difference of $2.5 \,V$ is applied across the faces of a germanium crystal plate. The face area of the crystal is $1 \,cm^2$ and its thickness is $1.0 \,mm$. The free electron concentration in germanium is $2 \times 10^{19} \,m^{-3}$ and the electron and hole mobilities are $0.33 \,m^2/V \cdot s$ and $0.17 \,m^2/V \cdot s$ respectively. The current across the plate will be .......... $A$.