Pure $Si$ at $500\, K$ has equal number of electron $(n_e)$ and hole $(n_h)$ concentrations of $1.5 \times 10^{16}\, m^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22}\, m^{-3}$. The doped semiconductor is of

  • A
    $p-$ type having electron concentration,$n_e = 5 \times 10^9\, m^{-3}$
  • B
    $n-$ type having electron concentration,$n_e = 5 \times 10^{22}\, m^{-3}$
  • C
    $p-$ type having electron concentration,$n_e = 2.5 \times 10^{10}\, m^{-3}$
  • D
    $n-$ type having electron concentration,$n_e = 2.5 \times 10^{23}\, m^{-3}$

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Which of the following statements is incorrect?

In a pure silicon crystal,the electron-hole concentration is $10^{16} \ m^{-3}$ at $301 \ K$. Now,$10^{21}$ atoms of phosphorus are added per cubic metre. The new hole concentration in silicon is (in per $m^3$):

$A$ transistor is a/an

$A$ $P$-type semiconductor has acceptor levels $57 \; meV$ above the valence band. The maximum wavelength of light required to create a hole is (Planck's constant $h = 6.6 \times 10^{-34} \; J \cdot s$, speed of light $c = 3 \times 10^8 \; m/s$)

The semiconductors are generally

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