An $n$-type and a $p$-type silicon semiconductor can be obtained by doping pure silicon with

  • A
    Boron and arsenic respectively.
  • B
    arsenic and boron respectively.
  • C
    sodium and magnesium respectively.
  • D
    indium and sodium respectively.

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An intrinsic semiconductor is converted into $N$-type extrinsic semiconductor by doping it with

Consider an $n$-type semiconductor in which $n_e$ and $n_h$ are the number of electrons and holes,respectively.
$(A)$ Holes are minority carriers.
$(B)$ The dopant is a pentavalent atom.
$(C)$ $n_e n_h \neq n_i^2$ (where $n_i$ is the number of electrons or holes in the semiconductor when it is in its intrinsic form).
$(D)$ $n_e n_h \geq n_i^2$.
$(E)$ The holes are not generated due to the donors.
Choose the correct answer from the options given below.

In an $N$-type semiconductor,where are the donor energy levels $E_D$ located?

Suppose a pure $Si$ crystal has $5 \times 10^{28}$ atoms $m^{-3}$. It is doped with $1 \text{ ppm}$ concentration of pentavalent $As$. Calculate the number of electrons and holes. $(n_i = 1.5 \times 10^{16} \text{ m}^{-3})$

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In an $n-$type semiconductor,which of the following statements is true?

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