Pure $Si$ at $500\,K$ has equal number of electron $(n_e)$ and hole $(n_h)$ concentrations of $1.5 \times 10^{16}\,m^{-3}$. Doping by indium increases $n_h$ to $4.5 \times 10^{22}\,m^{-3}$. The doped semiconductor is of

  • A
    $n-$type with electron concentration $n_e = 2.5 \times 10^{23}\,m^{-3}$
  • B
    $p-$type having electron concentration $n_e = 5 \times 10^9\,m^{-3}$
  • C
    $n-$type with electron concentration $n_e = 5 \times 10^{22}\,m^{-3}$
  • D
    $p-$type with electron concentration $n_e = 2.5 \times 10^{10}\,m^{-3}$

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